Hundreds of visitors experienced advanced technologies

November 13, 2019
Posted in News
November 13, 2019 admin

Over 500 visitors had the opportunity to contact and experience advanced technologies. With a privileged location in the main hall of the tradeshow, the removal of micropollutants, recalcitrant molecules, metals or organics were in the spotlight. More than 50 countries were interested in learning more about wastewater treatment advanced technologies developed by VentilAQUA.

Every 2 years in November, Amsterdam is the world water capital. As leading companies and professionals from around the world came together to discuss various aspects of the world’s most important resource, Water, through various events such as discussions or social projects.

In the total area of RAI Amsterdam, there were over 1,000 exhibitors, with more than 140 countries represented. In four days, over 25,000 professionals were present. As it should be, VentilAQUA was there for the sixth consecutive edition. This year, presenting a stand under the theme “New Generation of Wastewater Treatment and Reuse”.

New trends in industrial wastewater treatment such as Electro-coagulation or Electro-Fenton were highlighted. Real demonstrations were made by our VABEC and VADOF compact structures.

Here, you can see some photos of our stand and exposed compact units.

The demand for innovative solutions such as ours continues to occupy an increasing place in the large industrial wastewater treatment market. Several industry sectors were represented by its professionals, with particular emphasis on Textiles, Oil & Gas, Metals, Cosmetics, Serigraphic, Dairies or Domestic & Hotel.

Once again, VentilAQUA has proven to be at the forefront of industrial wastewater treatment and its reuse. We provide concrete and immediate answers to the efficiency of its technologies and the ROI made by companies.

Last but not least, VentilAQUA has already confirmed its presence in the 2021 edition at precisely the same location.

, , ,

Leave a Reply

Your email address will not be published. Required fields are marked *